SEMI F104-2020 Evaluation of Particulate Contribution of Components Used in Ultrapure Water and Liquid Chemical Distribution Systems

SEMI F104-2020 Evaluation of Particulate Contribution of Components Used in Ultrapure Water and Liquid Chemical Distribution Systems

The standard “SEMI F104-2020 Test method for evaluating particle contribution of components used in ultrapure water and liquid chemical distribution systems”, developed within the framework of the International Semiconductor Equipment and Materials (SEMI) program, describes the technical specifications and test methods for components to evaluate and compare particle contribution to the ultrapure water (UPW) fluid flow.

SEMI F104-2020 Evaluation of Particulate Contribution of Components Used in Ultrapure Water and Liquid Chemical Distribution Systems

The limitations of existing particle metrology make controlling particles in the advanced semiconductor industry extremely challenging. In this regard, SEMI F104 is a valuable industry standard for particle control in critical components. This standard has been completely revised to address the allowable particle contributions from components used in handling ultrapure liquids used in semiconductor processing. Recent updates have modified the procedure to accommodate larger components, added test procedures specific to larger components, and added specified values ​​for the allowable particle contributions. The significant difference between the bulk volume and surface area of ​​components when comparing small and large components means that different testing protocols must be applied. Therefore, the standard includes specific requirements for flow rates used across a range of parts to be tested. Further clarifications of existing test procedures and the addition of new procedures have been incorporated into the revised standard, along with specified values ​​for components across the size range.

The two test methods defined in this standard for assessing particle contribution are:

  • The rinse test method evaluates performance in a wash mode with the component in a static state (no actively moving components within the component being tested). It provides an indication of the wash volume required to bring particle levels up to specifications.
  • The dynamic test method evaluates performance during component operation and provides an indication of steady-state particulate contribution due to dynamic operating conditions.

These test methods apply to liquid chemical and ultrapure water system components designed for use in semiconductor manufacturing devices and auxiliary equipment. This standard describes methods for measuring particulate contamination from components when using ultrapure water as the test medium. For the purposes of this standard, ultrapure water is defined as water that meets the minimum requirements outlined in this standard. These methods utilize an in-situ liquid optical particle counter to measure performance.

Products manufactured for use in ultra-high-purity applications, such as the semiconductor or pharmaceutical industries, must ensure that no contaminants enter during processing. Valves used in these services must provide the highest levels of purity and performance. Trace analysis testing is performed in independent, accredited testing laboratories using ultrapure water rinses. Test results must demonstrate that the valves contribute significantly less particulate matter than the maximum allowable limits in the SEMI F104 standard, confirming their suitability for ultrapure applications.

In short, the SEMI F104 standard is essential in the semiconductor and high-tech industries, where even microscopic contamination can lead to significant product failures or performance losses. This standard helps ensure that materials used in cleanrooms are suitable and compliant with the stringent requirements of these ultra-clean environments.

This standard provides a standardized framework for referencing test data for materials used in cleanroom construction. It focuses on cleanliness, outgassing, particle formation, and chemical compatibility. The goal is to support the selection of materials that minimize contamination risks and support reliable semiconductor manufacturing processes.

The SEMI F104 standard outlines the key properties and data to consider when evaluating materials for use in cleanrooms. These include:

  • Outgassing behavior: The release of volatile substances from materials can compromise air purity in clean environments.
  • Particle formation: Materials should not emit particles that could deposit on sensitive components such as microchips.
  • Chemical resistance: Materials must withstand exposure to acids, solvents, and cleaning agents used in cleanrooms.
  • Cleanability: Materials must be capable of being easily cleaned and decontaminated.
  • Documentation and test method references: This standard supports the consistent use of standard test data to ensure comparability across suppliers and projects.

The SEMI F104 standard is applicable to a variety of construction materials used in clean rooms and mini-environments, including:

  • Polymers and plastics (e.g. PVC, PTFE)
  • Metals (e.g. stainless steel, aluminum)
  • Sealants and adhesives
  • Coatings and surface treatments

Each of these materials must be evaluated for compliance with cleanroom requirements using recognized testing protocols.

The SEMI F104 standard is critical to the semiconductor and high-technology manufacturing industries for these key reasons:

  • Minimizes contamination risks: Semiconductor manufacturing processes are extremely sensitive to even the slightest levels of contamination. This standard helps manufacturers select cleanroom materials that:
    • Does not emit harmful particles or volatile chemicals (off-gassing)
    • Resists bacterial growth and chemical degradation
    • Maintains surface cleanliness and integrity

This standard standardizes how materials are evaluated, reducing the risk of contamination that could cause defects or failures in microchips and chips.

  • Ensures consistency and comparability: The SEMI F104 standard provides a uniform method for referencing material data, making it easy to:
    • Engineers comparing materials from different suppliers
    • Buyers make informed, objective decisions
    • Facilities maintain consistency in cleanroom designs

This consistency supports reliable performance and reduces the possibility of introducing incompatible or substandard materials.

  • Promotes high yields and product quality: Cleanroom environments directly impact yield in semiconductor manufacturing. Contaminated materials can lead to:
    • Circuit malfunctions
    • Lower production efficiency
    • Costly recalls or rework

This standard helps manufacturers meet increasingly stringent quality standards by contributing to process reliability and higher yield rates.

  • Improves supply chain communication: This standard provides a common frame of reference, improving communication between:
    • Material suppliers
    • Clean room designers
    • Equipment manufacturers
    • Semiconductor factories

This reduces uncertainty and ensures that all stakeholders understand the required performance and cleanliness specifications.

  • Supports compliance with other standards: The SEMI F104 standard is often used in conjunction with other SEMI and ISO cleanroom standards. This standard completes testing and classification systems for:
  • Degassing (e.g. “SEMI E49 Guide for high purity and ultra-high purity piping performance, subassemblies and final assemblies” standard
  • Particle generation
  • Chemical compatibility

By referencing this standard, manufacturers can build cleanroom systems that comply with broader regulatory and industry requirements.

As a result, the SEMI F104 standard plays a vital role in high-precision industries where cleanroom integrity is non-negotiable. It helps protect sensitive manufacturing environments, ensures consistent material performance, and ultimately supports the production of high-quality, reliable semiconductor devices.

Our organization, which has been supporting businesses across all sectors for years through a wide range of testing, measurement, analysis, and evaluation activities, has a strong team of employees who closely follow global developments in science and technology and are constantly improving themselves. In this context, we also provide testing services in accordance with the SEMI F104-2020 standard for the "Test Method for Assessing Particulate Contribution of Components Used in Ultrapure Water and Liquid Chemical Distribution Systems."

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