The SEMI F115 standard, developed within the framework of an international standards program called the International Semiconductor Equipment and Materials (SEMI) program, which includes activities benefiting industries such as semiconductors, integrated circuits, transistors, diodes, and flat panel displays worldwide, defines a test method for identifying metallic elements present on the wetted surfaces of ultra-high purity (UHP) chemical delivery systems and components.
This test method is applicable to ultra-high purity chemical delivery systems and components. Examples of tests include valves, regulators, filters, mass flow controllers, piping, welding assemblies and face seal assemblies. This test method can also be used to detect contamination from an assembly or manufacturing site.
The aforementioned standard details the method of extracting and measuring the removable metallic elements with ultrapure water on wetted surfaces. This test method can also be used to evaluate the effectiveness of various washing or cleaning processes.
Ultra-high purity gases are widely used in the semiconductor industry. Ultra-high purity is generally defined as less than 100 ppb concentration for any volatile molecules such as impurity level or moisture.
While preparing this standard, the following SEMI standards were taken as reference:
Our company, among the numerous test, measurement, analysis and evaluation studies it provides for businesses in various sectors, with its trained and expert staff and advanced technological equipment, test services for the determination of metallic elements on the wet surfaces of ultra-high purity chemical distribution systems and components within the scope of SEMI F115 standard. also gives.
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