
Developed within the framework of an international standards program called International Semiconductor Equipment and Materials (SEMI), which includes activities for the benefit of industries such as semiconductor, integrated circuits, transistors, diodes and flat panel display worldwide, the SEMI F80 standard is technically approved by the Gases Global Technical Committee. is a standard. This standard describes a test method for determining the gas exchange / cleaning efficiency of the gas distribution system. This standard covers both conventional metal face sealing and surface mounted gas distribution systems. This test method is suitable for all high-purity gas distribution systems used in semiconductor manufacturing plants and comparable research and development areas.

It is important to remove ambient air from all parts of a high purity gas piping system prior to the introduction of process gas. This is necessary for two reasons:
It is necessary to remove process gas from any part of the piping system prior to exposure to ambient air. The reasons for this can be listed as follows:
Among the numerous tests, measurements, analyses, and evaluations our organization provides for businesses in various sectors, we also offer testing services to determine the gas exchange/discharge efficiency of gas distribution systems within the scope of the SEMI F80 standard, thanks to our trained and expert staff and advanced technological equipment.
